Quick Details
- ProName: Zirconium silicate
- CasNo: 10101-52-7
- Molecular Formula: O4SiZr2
- Purity: 65% Min
- LimitNum: 0
Superiority
Zirconium silicateZirconium Silicate
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Zirconium SilicateUsesZirconiumsilicateisusedform…
Details
Zirconium silicateZirconium Silicate
We Sell & We Serve
With Competitive Price
Zirconium Silicate UsesZirconium silicate is used for manufacturing refractory materials for applications where resistance to corrosion by alkali materials is required. It is also used in production of some ceramics, enamels, and ceramic glazes. In enamels and glazes it serves as an opacifier. It can be also present in some cements. Another use of zirconium silicate is as beads for milling and grinding. Thin films of zirconium silicate and hafnium silicate produced by chemical vapor deposition, most often MOCVD, can be used as a high-k dielectric as a replacement for silicon dioxide in semiconductors.Zirconium Silicate
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Zirconium Silicate UsesZirconium silicate is used for manufacturing refractory materials for applications where resistance to corrosion by alkali materials is required. It is also used in production of some ceramics, enamels, and ceramic glazes. In enamels and glazes it serves as an opacifier. It can be also present in some cements. Another use of zirconium silicate is as beads for milling and grinding. Thin films of Zirconium SilicateWe Sell & We ServeWith Competitive Price
Zirconium Silicate UsesZirconium silicate is used for manufacturing refractory materials for applications where resistance to corrosion by alkali materials is required. It is also used in production of some ceramics, enamels, and ceramic glazes. In enamels and glazes it serves as an opacifier. It can be also present in some cements. Another use of zirconium silicate is as beads for milling and grinding. Thin films of zirconium silicate and hafnium silicate produced by chemical vapor deposition, most often MOCVD, can be used as a high-k dielectric as a replacement for silicon dioxide in semiconductors.